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Liquid Photoresist

Material

Standard Thickness?

Achievable Thickness

Storage Modulus, 25°C

Glass Transition (°C)

Operating Temperature

 

Target Energy (mJ/cm2) Maximum Aspect Ratio

NR-2500

Yes

12-25µ

4.5 GPa

165°C

-60 to 200°C

160

8:1

NR-2300

No

8-14µ

4.5 GPa

165°C

-60 to 200°C

120

6:1

NR-2200

No

5-10µ

4.5 GPa

165°C

-60 to 200°C

80

4:1

NR-2050

No

2-4µ

4.5 GPa

165°C

-60 to 200°C

60

1:1

NR Series Liquid Photoresist:

  • Excellent chemical resistance
  • Excellent resolution capabilities
  • Consistent batch to batch photospeed optimized for production
  • Inherently tough formulation produces less brittle option over other negative image spin on epoxy photoresist